A coating device and a coating method are provided. The coating device comprises a coating station for coating a coating liquid on a band-shaped substrate running continuously, and a coat-adjusting station disposed downstream of the coating station for adjusting the coating liquid on the substrate so that the coating liquid layer is coated on the substrate at a predetermined thickness. The coating station and the coat-adjusting station comprise first and second bars for respectively coating and measuring the liquid agent. The coating liquid can be coated on evenly and in a stable manner even if the coating operation is performed with the substrate running at a high speed.
