A phase-change memory device includes memory cells, a memory cell array, a first electrode layer, a word line, and a bit line. The memory cell includes a phase-change layer formed on a semiconductor substrate. The memory cell array has the memory cells arranged in a matrix. The phase change layer includes first regions which contact the semiconductor substrate in units of memory cells and a second region which connects the first regions arranged in a same column. The first electrode layer is formed on the second region. A contact area of each first region and the semiconductor substrate is smaller than a contact area of the second region and the first electrode layer. The bit line is electrically connected to the first electrode layer. The bit line is connects in common the phase-change layers of the memory cells arranged in the same column.
An integrated circuit includes a logic portion including M conductive layers, a memory portion including N conductive layers, and at least one common top conductive layer over the logic portion and the memory portion. M is greater than N.
A memory cell has a heater element which generates heat by supplying electric current, a chalcogenide layer whose phase is changed by applying heat, and two transistors for driving the heater element. Bit lines extend in a predetermined direction and electrically connect with memory cells. Word lines extend at right angles to bit lines and electrically connect with memory cells. In a first cell row, memory cells are arranged at interval 2d along the bit lines. In a second row, memory cells are arranged such that the first cell row is shifted by distance d along the bit lines. First cell rows and second cell rows are alternately arranged at an interval e along the direction of word line so as to arrange the memory cells in a checker manner.
