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Method of dressing polishing pad and polishing apparatus
   
Document Number
US Patent 7066786
Issued Date
June 27, 2006
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Abstract
A method to quantitatively detect an optimum endpoint of dressing of a polishing pad with a non-destructive monitoring of a surface of the polishing pad is offered. The polishing pad is dressed for a predetermined period, and roughness of the surface of the polishing pad is measured with an optical measurement device made of a laser focus displacement meter. Then a characteristic curve representing a correlation between surface roughness of the polishing pad and dressing time is obtained. A gradient of the surface roughness versus dressing time characteristic curve is obtained. Dressing is stopped when the gradient reaches a predetermined value of gradient. These steps are repeated until the gradient of the surface roughness versus dressing time characteristic curve reaches the predetermined value of gradient.
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Number of Claims:
9
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Owner
Published
June 27, 2006
Application Number
10/941,083
Filed
September 15, 2004
US Classification
451/5   451/56
Int'l Classification
B24B   53/00   (20060101)  
Examiner
Attorney/Law Firm
Priority Data
Sep 17, 2003 [JP] 2003-324898
USPTO Field of Search
451/6   451/5   451/21   451/443   451/444   451/72   451/56  
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