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Feedforward, feedback wafer to wafer control method for an etch process
   
Document Number
US Patent 7158851
Issued Date
January 2, 2007
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Abstract
A method of using a run-to-run (R2R) controller to provide wafer-to-wafer (W2W) control in a semiconductor processing system is provided. The R2R controller includes a feed-forward (FF) controller, a process model controller, a feedback (FB) controller, and a process controller. The R2R controller uses feed-forward data, modeling data, feedback data, and process data to update a process recipe on a wafer-to-wafer time frame.
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Number of Claims:
25
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Owner
Published
January 2, 2007
Application Number
10/609,129
Filed
June 30, 2003
US Classification
700/121   700/31
Int'l Classification
G06F   19/00   (20060101)  
Assistant Examiner
USPTO Field of Search
700/1   700/31   700/121  
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