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Lithography for optical patterning of fluids
   
Document Number
US Patent 7180581
Issued Date
February 20, 2007
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Abstract
An illuminator (e.g., laser) produces a light beam that partially passes through, and is partially blocked by, a mask contrastingly patterned via non-transparent and transparent portions. The mask-conformed light passes through a lens so that the mask's pattern is projected into fluid seeded with a luminescent substance, which illuminatively reveals an image of the mask's pattern. The light beam can also be expanded and/or diffused prior to reaching the mask. Instead of or in addition to transmissive properties, the mask can have reflective properties wherein the illuminator-produced light beam partially bounces off of, and is partially absorbed by, a mask contrastingly patterned via non-reflective and reflective portions. Reflective optics can supplement or replace refractive optics for projecting the mask's pattern into the fluid. Indication of fluid flow and/or fluid concentration change is afforded through perceived distinctions between the illuminatively revealed images obtained at the same location at different times.
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Lithography for optical patterning of fluids - US Patent 7180581 Drawing
Drawing from US Patent 7180581
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Number of Claims:
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Published
February 20, 2007
Application Number
10/932,647
Filed
September 2, 2004
US Classification
356/28.5  
Int'l Classification
G01P   3/36   (20060101)  
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Parent Case
CROSS-REFERENCE TO RELATED APPLICATIONS This application claims the benefit of U.S. provisional application No. 60/500,236, filed 5 Sep. 2003, hereby incorporated herein by reference, entitled "Lithography for Optical Patterning of Fluids," joint inventors Jerry W. Shan and Paisan Atsavapranee.
USPTO Field of Search
356/28.5  
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