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Depositing an oxide
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Document Number
US Patent 7192890
Issued Date
March 20, 2007
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Inventors
Zhou; Ying
(Tigard, OR)
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Metz; Matthew V.
(Hillsboro, OR)
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Brask; Justin K.
(Portland, OR)
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Burghard; John
(Vernonia, OR)
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Kuhn; Markus
(Beaverton, OR)
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Datta; Suman
(Beaverton, OR)
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Chau; Robert S.
(Beaverton, OR)
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Abstract
A dielectric deposited on a substrate may be exposed to a salt solution. While exposed to the salt solution, an oxide is deposited on the dielectric.
Patent Report
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depositing
oxide
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Number of Claims:
22
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Owner
Intel Corporation
(Santa Clara, CA)
Published
March 20, 2007
Application Number
10/696,204
Filed
October 29, 2003
US Classification
438/778
257/E21.271 257/E23.095 438/782
Int'l Classification
H01L 21/31 (20060101) H01L 21/469 (20060101)
Examiner
Estrada; Michelle
Attorney/Law Firm
Trop, Pruner & Hu, P.C.
USPTO Field of Search
438/678 438/778 438/782 438/FOR390 438/FOR395 257/E23.095
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Methods for forming a high dielectric
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