The present invention is in related to a miniature surface plasmon resonance waveguide device with sinusoidal curvature compensation and at least comprises: a substract, a waveguide structure, a sensing film layer and a cover layer, wherein the waveguide structure is configured with the function of sinusoidal curvature compensation and installed above the substract, further that, the waveguide structure includes a light input port and a light output port; the sensing film layer is on a special region of the waveguide structure, the special region is a sensing region; the cover layer is upper than the substract and has an opening. By means of the optimal curve figure of the sinusoidal curvature compensation, attenuation of light energy can be minimized while in propagation, and allows the input and output of the light on the same side of the device.
A method of making a microresonator device includes the steps of providing at least a first substrate and providing a waveguide integrated on the substrate. The waveguide includes a core and a metal cladding layer on at least part of one boundary of the core. Another step is positioning a microresonator so that it is in an optically coupling relationship with the waveguide.
There are several different applications where it is desirable to increase the amount of material that can be introduced to the surface of a microresonator that has whispering gallery modes. The use of a porous surface on the microresonator permits greater amounts of the material to be captured on or near the surface of the microresonator, resulting in an increased optical interaction between the material and the light propagating in the whispering gallery mode(s) of the microresonator.
