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Method for depositing gallium oxide coatings on flat glass
 
   
Document Number
US Patent 7223441
Issued Date
May 29, 2007
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Abstract
A chemical vapor deposition process for laying down a gallium oxide coating on a glass substrate through the use of an organic ester and an inorganic gallium halide. The organic ester preferably contains 3-6 carbon atoms which contributes to obtaining a high deposition rate. The chemical vapor deposition method to form the gallium oxide coating is preferably at, essentially, atmospheric pressure. The resulting article has a gallium oxide coating which can be of substantial thickness because of the high deposition rates attainable. The coating deposition rates resulting from the method of the present invention are preferably greater than or equal to 75 .ANG. per second.
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Number of Claims:
14
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Published
May 29, 2007
Application Number
10/797,450
Filed
March 10, 2004
US Classification
427/248.1   427/255.23 427/255.28
Int'l Classification
C23C   16/00   (20060101)  
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Assistant Examiner
Attorney/Law Firm
USPTO Field of Search
427/248.1   427/255.23   427/255.28  
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