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Vapor deposition of dissimilar materials
   
Document Number
US Patent 7329436
Issued Date
February 12, 2008
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Abstract
A method for depositing a first material on a substrate includes providing the substrate in a deposition chamber. A molten body is formed between the substrate and a source of the first material by melting one or more second materials. A flow of the first material is passed through the molten body and from the molten body to the substrate as a vapor flow. An essentially non-expending portion of the molten body comprises an alloy having a melting temperature below a melting temperature of the first material.
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Number of Claims:
20
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Owner
Published
February 12, 2008
Application Number
10/991,605
Filed
November 17, 2004
US Classification
427/250  
Int'l Classification
C23C   16/00   (20060101)  
Examiner
Assistant Examiner
Attorney/Law Firm
USPTO Field of Search
427/250  
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