US Patent 7348565 - Illumination system particularly for microlithography

Illumination system particularly for microlithography

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Document Number

US Patent 7348565

Issued Date

March 25, 2008

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Inventors

Mann; Hans-Juergen (Oberkochen,DE)

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Singer; Wolfgang (Aalen,DE)

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Schultz; Joerg (Aalen,DE)

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Wangler; Johannes (Koenigsbronn,DE)

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Schuster; Karl-Heinz (Koenigsbronn,DE)

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Dinger; Udo (Oberkochen,DE)

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Antoni; Martin (Aalen,DE)

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Ulrich; Wilhelm (Aalen,DE)

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Abstract

There is provided a projection exposure apparatus for microlithography using a wavelength less than or equal to 193 nm. The apparatus includes an optical element with a pupil raster element, and a projection objective with a real entrance pupil. The optical element is situated in or near a plane defined by the real entrance pupil.