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Method of inspecting monocular diplopia and eye mark pattern for use in the same
   
Document Number
US Patent 7407290
Issued Date
August 5, 2008
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Inventors
Hasegawa; Masahiro (Kaitori 1-chome, Tama-shi, Tokyo 206-0012,JP)
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Abstract
In order to examine a degree of monocular diplopia is easily examined in a quantitative manner, a plurality of circular eye marks are seen from a predetermined examination distance with a single eye of a patient to find a particular eye mark whose double vision images are observed to be circumscribed each other, and a degree of monocular diplopia is determined by a view angle of the relevant circular eye mark. Since the eye mark is formed as a circular pattern, a degree of monocular diplopia can be examined irrespective of an axial direction along which double vision images appear.
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Number of Claims:
17
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Published
August 5, 2008
Application Number
11/337,343
Filed
January 23, 2006
US Classification
351/239   351/240 351/241
Int'l Classification
A61B   3/02   (20060101)  
Examiner
Assistant Examiner
Priority Data
Apr 06, 2005 [JP] 2005-109569
USPTO Field of Search
351/239   351/240   351/241   351/246  
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