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Chemical vapor deposition of hydrogel films
   
Document Number
US Patent 7431969
Issued Date
October 7, 2008
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Inventors
Chan; Kelvin (Santa Clara, CA)
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Abstract
In one embodiment of the invention, iCVD is used to form linear thin films using a radical initiator and an alkene. In another embodiment, iCVD is used to form crosslinked thin films by the addition of a crosslinking agent (e.g., a diacrylate or a dimethyacrylate). The incorporation of a crosslinking agent into the thin films is shown to increase systematically with its partial pressure. In one embodiment, when the crosslinker is EDGA and the monomer is HEMA it results in crosslinked P(HEMA-co-EGDA) copolymer. In another embodiment, when the crosslinker is EDGA and the monomer is VP, it results in crosslinked P(VP-co-EGDA). Disclosed are the effects of crosslinker incorporation on the thermal and the wetting properties of the polymers. The unique swelling properties of these films are also described; certain films of the present invention are hydrogels when soaked in water.
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Number of Claims:
17
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Published
October 7, 2008
Application Number
11/198,932
Filed
August 5, 2005
US Classification
427/255.6   427/255.28
Int'l Classification
C23C   16/00   (20060101)  
Examiner
Assistant Examiner
USPTO Field of Search
427/255.28   427/255.6   427/248.1  
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