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Method for the growth of large low-defect single crystals
   
Document Number
US Patent 7449065
Issued Date
November 11, 2008
Link
Inventors
Powell; J. Anthony (North Olmsted, OH)
Neudeck; Philip G. (Olmsted Falls, OH)
Trunek; Andrew J. (Chargin Falls, OH)
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Abstract
A method and the benefits resulting from the product thereof are disclosed for the growth of large, low-defect single-crystals of tetrahedrally-bonded crystal materials. The process utilizes a uniquely designed crystal shape whereby the direction of rapid growth is parallel to a preferred crystal direction. By establishing several regions of growth, a large single crystal that is largely defect-free can be grown at high growth rates. This process is particularly suitable for producing products for wide-bandgap semiconductors, such as SiC, GaN, AlN, and diamond. Large low-defect single crystals of these semiconductors enable greatly enhanced performance and reliability for applications involving high power, high voltage, and/or high temperature operating conditions.
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Number of Claims:
46
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Owner
Ohio Aerospace Institute (Cleveland, OH)
Published
November 11, 2008
Application Number
11/633,111
Filed
December 2, 2006
US Classification
117/84   117/108 117/109 117/93
Int'l Classification
C30B   25/12   (20060101)   C30B   25/14   (20060101)  
USPTO Field of Search
117/84   117/93   117/108   117/109   438/478  
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