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Ellipsometry measurement and analysis
 
   
Document Number
US Patent 7453562
Issued Date
November 18, 2008
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Abstract
A method of performing a measurement of properties of a sample, by directing a first beam of light at the sample, where a combination of the wavelength, energy, and length of time is sufficient to cause temporary damage to the sample. The first beam is reflected from the sample. The properties of the reflected beam are sensed to create a signal. A length of time is waited, sufficient for the damage to substantially heal, before a second beam of light is directed at the sample, where a combination of the wavelength, energy, and length of time is sufficient to cause temporary damage to the sample. The second beam is reflected from the sample. The properties of the reflected beam are sensed to create a signal. The first and second electrical signals are analyzed to determine the properties of the sample.
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Number of Claims:
20
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Owner
KLA-Tencor Corporation (San Jose, CA)
Published
November 18, 2008
Application Number
11/863,334
Filed
September 28, 2007
US Classification
356/237.2  
Int'l Classification
G01N   21/00   (20060101)  
Examiner
Attorney/Law Firm
Parent Case
This application claims all priorities and other benefits of prior pending U.S. provisional application 60/970,294, filed 2007 Sep. 6.
USPTO Field of Search
356/237.1  
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