Methods, systems and apparatus for using nanoparticle seeded short-wavelength discharge generator sources discharge sources, for use with X-ray, XUV and EUV light emissions. Applications can include EUV lithography. Additional embodiments can use the generator sources for Hollow Cathode Plasma Discharge (HCPD) lamps, and dense plasma focus (DPF) devices and other sources. Target streams of gases such as Xe and nanoparticles such as tin, copper, or lithium can be heated with laser type sources to emit nano-droplets therefrom.
This invention claims the benefit of U.S. Provisional Patent Application Ser. No. 60/517,523 filed Nov. 5, 2003, and this invention is a Continuation-In-Part of U.S. application Ser. No. 10/082,658 filed Oct. 19, 2001, now U.S. Pat. No. 6,865,255, which is a continuation-in-part of U.S. application Ser. No. 09/881,620 filed Jun. 14, 2001, now U.S. Pat. No. 6,831,963 that further claims the benefit of U.S. Provisional application No. 60/242,102 filed Oct. 20, 2000, and which is a Continuation-In-Part of U.S. application Ser. No. 09/685,291 filed Oct. 10, 2000, now U.S. Pat. No. 6,377,651 that further claims the benefit of U.S. Provisional Application No. 60/158,723 filed Oct. 11, 1999, and this invention is a Continuation-In-Part of U.S. application Ser. No. 10/795,814 filed Mar. 8, 2004, now U.S. Pat. No. 6,862,339.
