or
Bookmark and Share
Semiconductor device, method of manufacturing the same, and phase shift mask
   
Document Number
US Patent 7498659
Issued Date
March 3, 2009
Link
Map
Abstract
A main wall part is provided so as to surround an integrated circuit part. A sub-wall part which is in "L" shape is provided between each corner of the main wall part and the integrated circuit part. Therefore, even if the stress is concentrated due to heat treatment or the like, the stress is dispersed to the main wall part and the sub-wall part, and hence peeling between layers and a crack are unlikely to occur, as compared with the conventional art. Further, even if the crack and the like occur at the corner, moisture from the outside hardly reaches the integrated circuit part when the main wall part and the sub-wall part are coupled to each other. For this reason, it is possible to ensure an extremely high moisture resistance.
Tags:
Description:
Amusing 0%
Clever 0%
Complex 0%
Efficient 0%
Historic 0%
Important 0%
Innovative 0%
Interesting 0%
Practical 0%
Simple 0%
Number of Claims:
8
Comments:
no comments yet
Published
March 3, 2009
Application Number
11/352,273
Filed
February 13, 2006
US Classification
257/620   257/758 257/E23.145
Int'l Classification
H01L   23/544   (20060101)  
Examiner
Parent Case
CROSS-REFERENCE TO RELATED APPLICATIONS This application is a divisional of U.S. application Ser. No. 10/349,934 filed Jan. 24, 2003, now U.S Pat. No. 7,129,565.
Priority Data
Mar 15, 2002 [JP] 2002-072737 Sep 30, 2002 [JP] 2002-286687
USPTO Field of Search
257/620   257/758   257/E23.145  
Related Patents
Claims
Description
About| FAQs| Terms & Disclaimer| Link to Us| Contact Us