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Alkoxide compound, thin film-forming material and method for forming thin film
   
Document Number
US Patent 7501153
Issued Date
March 10, 2009
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Abstract
The alkoxide compound of the present invention is represented by general formula (I) below. The alkoxide compound of the present invention is an iron compound that can be delivered in a liquid state and is easily vaporized due to its high vapor pressure. The compound particularly enables production of thin films with excellent composition controllability, and hence is suitable for producing multi-component thin films by CVD. ##STR00001## (In the formula, R.sup.1 and R.sup.2 each independently represent a hydrogen atom or C.sub.1-4 alkyl group, R.sup.3 and R.sup.4 each represent a C.sub.1-4 alkyl group, and A represents a C.sub.1-8 alkanediyl group.)
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Number of Claims:
13
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Published
March 10, 2009
Application Number
11/665,833
Filed
October 5, 2005
US Classification
427/248.1   106/286.3 106/287.18 427/255.28
Int'l Classification
C23C   16/00   (20060101)   C09D   1/00   (20060101)  
Examiner
Attorney/Law Firm
Priority Data
Oct 21, 2004 [JP] 2004-306777 Nov 29, 2004 [JP] 2004-343513
USPTO Field of Search
427/248.1   427/255.28  
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