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Photosensitive resin composition and method for the formation of a resin pattern using the composition
   
Document Number
US Patent 7504191
Issued Date
March 17, 2009
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Abstract
A photosensitive resin composition and a method for the formation of a resin pattern using the photosensitive resin composition are provided. The photosensitive resin composition contains, as a catalyst precursor, a catalytic metal element with a metal-deposition catalytic activity suitable for electroless metal plating. The method for the formation of a resin pattern uses a photosensitive resin composition, which contains, as a catalyst precursor, a catalytic metal element with a metal-deposition catalytic activity suitable for electroless metal plating. By using the method of this invention, it is possible to form a conductive film selectively on a resin pattern formed through exposure and development of the photosensitive resin composition of this invention.
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Number of Claims:
15
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Published
March 17, 2009
Application Number
10/768,859
Filed
January 30, 2004
US Classification
430/270.1   430/280.1 430/311
Int'l Classification
G03F   7/00   (20060101)   G03F   7/004   (20060101)  
Examiner
Attorney/Law Firm
Priority Data
Jan 31, 2003 [JP] 2003-024257
USPTO Field of Search
430/270.1   430/311  
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