A plasma is produced in a treatment space (58) by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes (54,56) separated by a dielectric material (64), and a precursor material is introduced into the treatment space to coat a substrate film or web (14) by vapor deposition or atomized spraying at atmospheric pressure. The deposited precursor exposed to an electromagnetic field (AC, DC, or plasma) and then it is cured by electron-beam, infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being deposited. Additional plasma post-treatment may be used to enhance the properties of the resulting coated products.
RELATED APPLICATIONS
This application is a continuation-in-part of U.S. Ser. No. 11/448,966, filed on Jun. 7, 2006 (issued as U.S. Pat. No. 7,300,859), which is a continuation-in-part of U.S. Ser. No. 10/883,167, filed on Jul. 1, 2004 (issued as U.S. Pat. No. 7,067,405), which is a continuation-in-part of U.S. Ser. No. 10/228,358, filed on Aug. 26, 2002 (issued as U.S. Pat. No. 6,774,018), which is a continuation-in-part of Ser. No. 09/660,003, filed on Sep. 12, 2000 (issued as U.S. Pat. No. 6,441,553), which is a continuation-in-part of Ser. No. 09/241,882, filed on Feb. 1, 1999 (issued as U.S. Pat. No. 6,118,218).
