US Patent 7573568 - Method and apparatus for detecting a photolithography processing error, and method and apparatus for monitoring a photolithography process

Method and apparatus for detecting a photolithography processing error, and method and apparatus for monitoring a photolithography process

Document Number

US Patent 7573568

Issued Date

August 11, 2009

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Inventors

Yang; Yu-Sin (Seoul,KR)

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Jun; Chung-Sam (Suwon-si,KR)

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Chon; Sang-Mun (Yongin-si,KR)

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Choi; Sun-Yong (Sungnam-si,KR)

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Abstract

An apparatus for monitoring a photolithography process includes a measurer and a data processor. The measurer measures an optical characteristic of a substrate. The data processor determines defectiveness of the substrate based on the optical the measurer.