A system, method, and apparatus for mitigating contamination associated with ion implantation are provided. An ion source, end station, and mass analyzer positioned between the ion source and the end station are provided, wherein an ion beam is formed from the ion source and selectively travels through the mass analyzer to the end station, based on a position of a beam stop assembly. The beam stop assembly selectively prevents the ion beam from entering and/or exiting the mass analyzer, therein minimizing contamination associated with an unstable ion source during transition periods such as a start-up of the ion implantation system.
REFERENCE TO RELATED APPLICATION
This application claims priority to and the benefit of U.S. Provisional Application Ser. No. 60/687,514 which was filed Jun. 3, 2005, entitled PARTICULATE PREVENTION IN ION IMPLANTATION, the entirety of which is hereby incorporated by reference as if fully set forth herein.
