Disclosed is a technique for the protection of micro-electronic circuits. A room temperature vulcanizing silicone rubber is applied over the circuit. While the rubber is in an uncured state, a solvent-resistant cover coating is applied thereon. The resulting structure is then treated so that both layers cure simultaneously. The resulting dual layer provides protection against contaminants and solvents used in the circuit fabrication. In addition, mechanical protection is provided for crossovers and circuit chips.
A method of manufacture of an integrated MOS semiconductor array for the low-frequency range having MOS components and circuit paths arranged on a semiconductor substrate. Exposed surfaces between the circuit paths are made hydrophobic by germinating with hexamethyl disilazane ((CH.sub.3).sub.3 SiNHSi(CH.sub.3).sub.3), so that the occurrence of leakage currents is avoided. In addition, in an integrated MOS semiconductor array in which the MOS components and the circuit path are covered with a protective layer, the surface of this protective layer is made hydrophobic. As a result, both leakage currents and parasitic capacitances are prevented.
A process for producing an electronic part which comprises: coating a predetermined surface of the electronic part with a composition comprising as basic ingredients 100 parts by weight of a polyorganosiloxane having an alkenyl group, 0.01 to 10 parts by weight of an organic peroxide and 0.01 to 20 parts by weight of an adhesion promoter, thereby to form a layer of the composition adhered to the predetermined surface of the electronic part; subjecting said electronic part having adhered thereto the composition layer to heat treatment, thereby to convert said composition layer into a layer of a cured elastomer having surface tackiness; and forming a protective sealing resin layer on the cured elastomer layer having surface tackiness.
There is provided a method of producing a semiconductor device comprising a protecting silicone gel layer which covers a semiconductor chip and bonding wires for taking electrodes out of this chip, and a resin layer which has a smaller thermal expansion coefficient than that of this silicone gel layer at least part of which contacts the silicone gel layer. This method comprises the steps of: thermally expanding the silicone gel layer until it reaches the product environmental guarantee temperature which comes before the cure acceleration reaction in the resin layer; and completely curing the resin layer while maintaining the volume of the silicone gel layer at the same time, thereby fixedly adhering it with the other parts.
This invention is directed to composite coating for maintaining low moisture levels at the surface of solid substrates. One embodiment of the invention comprises a coating having a desiccant layer between layers of the same or different elastomeric polymers. Another embodiment comprises a layer of elastomeric polymer covered with a layer of an elastomeric polymer/desiccant mixture. The composite coating may be applied to integrated circuits to prevent corrosion thereof.
An impermeable encapsulation system for integrated circuit chips utilizes a polyimide-siloxane block copolymer as an undercoat applied to the chip surface and an impermeable outer coat comprised either of a non-reactive metal, such as titanium, tantalum or aluminum, or an amorphous semiconductor material comprising silicon-boron. All of these materials may be effectively applied at temperatures sufficiently low to avoid damaging the chip.
