or
Methods of forming patterned constructions, methods of patterning semiconductive substrates, and methods of forming field emission displays



Bookmark and Share
PDF+Word+Text
Download of US
Patent 6207578
Bulk Download
of 50+ Related
Patent PDFs
$39.95
Document Number
US Patent 6207578
Issued Date
March 27, 2001
Link
Map
Abstract
In one aspect, the invention includes a method of patterning a substrate. A film is formed over a substrate and comprises a plurality of individual molecules. The individual molecules comprise two ends with one of the two ends being directed toward the substrate and the other of the two ends being directed away from the substrate. Particle-adhering groups are bound to said other of the two ends of at least some of the individual molecules and a plurality of particles are adhered to the particle-adhering groups to form a mask over the substrate. The substrate is etched while the mask protects portions of the substrate. In another aspect, the invention encompasses a method of forming a field emission display. A material having a surface of exposed nitrogen-containing groups is formed over the substrate. At least one portion of the material is exposed to radiation while at least one other portion of the material is not exposed. The exposing renders one of the exposed or unexposed portions better at bonding the masking particles than the other of the exposed and unexposed portions. After the exposing, the material is bonded with masking particles. The adhered masking particles define a mask over the semiconductive substrate. The substrate is etched while the patterned mask protects portions of the substrate. A plurality of emitters are formed from the substrate. A display screen is provided to be spaced from the emitters.
Drawing
Methods of forming patterned constructions, methods of patterning semiconductive substrates, and methods of forming field emission displays - US Patent 6207578 Drawing
Drawing from US Patent 6207578
Tags:
Description:
Amusing 0%
Clever 0%
Complex 0%
Efficient 0%
Historic 0%
Important 0%
Innovative 0%
Interesting 0%
Practical 0%
Simple 0%
Number of Claims:
66
Comments:
no comments yet
Owner
Published
March 27, 2001
Application Number
09/251,905
Filed
February 19, 1999
US Classification
438/706   257/E21.024 438/707 438/709 438/719 438/725
Int'l Classification
H01L   21/027   (20060101)   H01L   21/02   (20060101)   H01J   9/02   (20060101)  
Assistant Examiner
USPTO Field of Search
438/706   438/707   438/709   438/725   438/719   430/296   430/326   430/273   430/283   430/191   156/278  
Related Patents
6521541 - Surface preparation of substances for continuous convective assembly of fine particles - Owned by California Institute of Technology (Pasadena, CA)

A method for producing periodic nanometer-scale arrays of metal or semiconductor junctions on a clean semiconductor substrate surface is provided comprising the steps of: etching the substrate surface to make it hydrophilic, forming, under an inert atmosphere, a crystalline colloid layer on the substrate surface, depositing a metal or semiconductor material through the colloid layer onto the surface of the substrate, and removing the colloid from the substrate surface. The colloid layer is grown on the clean semiconductor surface by withdrawing the semiconductor substrate from a sol of colloid particles.

Claims
Description
About| FAQs| Terms & Disclaimer| Link to Us| Contact Us