A system for implementing Berek-type variable retarder plate tipping capability in two orthogonal directions via tipping about a single axis, in combination with a means for rotating the orientation of the axis, having application in ellipsometer and polarimeter and the like systems.

A method for inspecting the painting of bodywork parts using an optical measurement instrument that is moved parallel to the parts being inspected. An inspection station for implementing the method.

The present disclosure provides an apparatus for handling a liquid sample, wherein the apparatus includes integrated sample processing and sample evaluating components. The sample processing and evaluating components can include solid matrices that allow for optical measurement of a sample, or for the removal of contaminants from a sample. Methods for using the apparatus to handle liquid samples and evaluate sample components are also provided.

A fluorescence detection system for testing a sample having at least one fluorophore. The fluorescence detection system comprises a white light generation system outputting a white light pulse. The white light pulse has a first frequency range and a first time duration. The white light pulse excites the at least one fluorophore of the sample to emit a fluorescence. The fluorescence has a second frequency range and a second time duration, wherein the first time duration is less than the second ti...

A colorimetry device having a light source for irradiating light to a measured object, a cover part provided with a take-out port for taking out light diffused from the measured object, and a placing part on which the measured object is placed, the measured object being put between the cover part and the placing part, so as to effect the color measurement of the measured object. A hinge mechanism is provided, so that when the measured object is placed on the placing part and the cover part is in...

A wafer detection method. A plurality of PSL particles are sprayed on a wafer. An inspection operation is implemented on the wafer to obtain location information corresponding to a plurality of defects on the wafer, each location information corresponding to the defects comprises an error value. An inspection operation implemented on the PSL particles to obtain location information corresponding to the PSL particles. Offset location information corresponding to each defect is calculated accordin...

A surface texture measuring instrument provided with a near-field measuring unit (30) including a near-field probe (33) that forms a near-field light at a tip end thereof when a laser beam is irradiated, a laser source (35) that generates the laser beam to be irradiated on the near-field probe (33), a detection element (38) that detects scattering effect of the near-field light generated when the near-field probe (33) is moved close to a workpiece (1), and an actuator (32) that displaces the nea...

A method for generating a mask for use with a light measurement system that includes a light source for projecting light onto a surface of an object, and an imaging system for receiving light reflected from the surface of the object. The method includes determining a profile of the object to be inspected, and generating a mask based on the determined profile, wherein the mask includes an opening extending therethrough that has a profile that substantially matches a profile of the object as viewe...

In a flatness measurement apparatus, a sensor unit having a flatness-detection sensor is slidable along the linear guide rail. A support system supports the linear guide rail such that the linear guide rail is rotatable in a horizontal plane, whereby a surface of a wafer stage to be measured is scanned all over with the sensor unit having the flatness-detection sensor so as to ensure a flatness measurement of the whole surface of the wafer stage.

A system for measuring dimension of photomasks comprises a light source emitting measuring light having a wavelength, a transmission detector for receiving the measuring light, a stage on which a photomask having circuit patterns is placed, the stage being disposed between the light source and the transmission detector, and a controller having a dimension-deciding algorithm to determine a dimension of the circuit patterns from a spectroscopic characteristic of the received measuring light, the c...