Disclosed are a method for removing a photoresist layer and a method for forming a metal line using the same. The method for removing a photoresist pattern, including the steps of: forming a bottom layer on a substrate by using the photoresist pattern as a mask; and removing the photoresist pattern with use of a high density plasma (HDP) apparatus. The method for forming a metal line, including the steps of: preparing a semi-finished substrate including an inter-layer insulation layer; forming a...

The present disclosure provides for a device, as well as a system and method associated therewith, for, among other things, providing: (i) up to five distinct measurement angles along with an illumination reference channel; (ii) a plurality of illumination sources that provide a focused beam of illumination at specific desired angles of incidence to a sample under target; (iii) a shutter mechanism incorporating a calibration transfer standard; (iv) an internal optical system that is operatively ...

In accordance with an embodiment of the present invention, an apparatus for measuring light scatter loss from a test piece includes a light source, an optical cavity including the test piece and at least one mirror located along a path, and a light detector. The cavity receives an input beam from the light source, circulates a beam within the cavity as a circulating beam, and produces an output beam. Irregularities on the surface of the test piece result in a progressive diffusion of the circula...

A far-field optical microscope capable of reaching nanometer-scale resolution using the in-plane image magnification by surface plasmon polaritons is presented. The microscope utilizes a microscopy technique based on the optical properties of a metal-dielectric interface that may, in principle, provide extremely large values of the effective refractive index n.sub.eff up to 10.sup.2-10.sup.3 as seen by the surface plasmons. Thus, the theoretical diffraction limit on resolution becomes .lamda./2n...

A method, system and apparatus for improving at least one of a) optical interactance measurements, b) optical transmittance measurements and c) optical reflectance measurements. The apparatus has a probe having a body portion and an tip portion. The body portion has a central tubular element having an opening therethrough. The tip portion has a central aperture and a number that is a plurality of ring openings therein. At least some of the plurality of rings are angled with respect to a longitud...

A method for inspecting a grating biochip comprises the steps of irradiating a grating biochip using a light beam, measuring a diffracted light using a photodetector, selecting a plurality of parameters of the grating biochip, and optimizing the parameters to enhance the detection sensitivity, wherein the diffracted light is generated by the light beam passing the grating biochip. The grating biochip comprises a grating structure including a semiconductor substrate, a grating positioned on the s...

An optical measuring apparatus comprises: an illuminating section that illuminates a first object with a first light; a light changing section that changes an intensity of the first light illuminating the first object; a light receiving device that receives a second light transmitted through or reflected from the first object; and an output section that outputs a measurement result according to i) a state of the light changing section and ii) an amount of the second light received by the light r...

A via-filling material includes a polymer containing a repeating unit represented by ##STR00001## wherein R.sub.1 one of hydrogen, fluorine, chlorine, bromine, and methyl group; R.sub.2 is one of hydrogen, a C.sub.1-3 alkyl group, and a C.sub.1-4 alkyl group in which the hydrogen is replaced by at least one of fluorine, chlorine, and bromine; and X is --C(.dbd.O)O-- or --S(.dbd.O).sub.2O--. This via-filling material does not generate deposits around an opening of a via hole during plasma etching...

An optical apparatus includes an optical device arranged on an optical path extending from a light source to a predetermined position, an optical sensor, and a measuring device which measures an optical characteristic or a change in an optical characteristic of the optical device on the basis of an output from the optical sensor. The optical sensor is arranged outside the optical path and senses light which is emitted from a second light source arranged outside the optical path and is reflected ...

The present invention relates to a device for measuring transmission and reflection properties of objects and surfaces and a method for operating said device. The device is equipped with a housing, an optical measuring base unit and preferably a source of radiation for emitting radiation at a predetermined angle onto a measurement surface, as well as a detecting means for detecting the radiation reflected from said measurement surface. An elastic retaining means serves to elastically support the...