Vertical rate deflection signals are generated using a combination of digital and analog techniques. A signal is generated by a switched capacitor type accumulator circuit, a wave shape control circuit, and a DC signal centering circuit. The signal is periodically reset by initializing a first storage circuit in the accumulator circuit to an initial start voltage. A buffer couples the first storage circuit to a first signal output. A second signal output is produced by generating a controlled of...

A non-contact type wheel alignment measuring apparatus includes a fixed-focal-length lens and a pair of light sources located on the opposite sides of the lens for projecting a pair of laser beams onto the side surface of a wheel to be measured. The apparatus also includes a CCD sensor on which images reflecting from the wheel are formed and the distance between the two images is detected as a function of pixels of CCD sensor between them. The information of this distance (or the number of pixel...

Scattered or/and transmitted light is employed to determine characteristics, including dimensional information, of an object (60) such as part (10) of a flat-panel display. The dimensional information includes the average diameter of openings (62) in the object, the average density of the openings, and the average thickness of a layer (64) of the object. Light-diffraction patterns are produced to determine characteristics, such as abnormalities (146 and 148), of crossing lines (140 and 142) in s...

An omega-shaped core is wrapped with two coils arranged to be responsive to magnetic permeable metal and conductive metal objects. The omega core allows the proximity sensor to operate as a saturated core sensor, a variable reluctance sensor or an eddy current loss sensor. The core is made from a thin, highly permeable metal that is preferably formed from a single piece of sheet metal, and comprises a substantially flat, rectangular member bent in four locations to form a head portion, two legs,...

A flatness measuring apparatus measures flatness of a substrate on which a specific pattern is to be formed by adjusting focus to a forming reference flat plane obtained based upon height data corresponding to specific measuring points of the substrate. The flatness measuring apparatus includes: an arithmetic operation device that obtains height data at predetermined measuring points of the substrate, determines a flatness judging criterion flat plane based upon height data at measuring points l...

A miter cutting guide apparatus is provided to aid in the making of miter cuts used on wood millwork as trim around floors, walls, doors, cabinets and the like and which can also be used on ceramics such as for tile cutting. Two miter arms are pivotally attached by a pivot locking means such as a screw. Each miter arm has a complementary base resting underneath and being guidably received by each miter arm, thereby allowing each miter arm to reciprocate along its complementary base.

A method and portable apparatus to evaluate the planar flatness of a paper sheet comprises a pair of closely spaced horizontal edges secured in relative parallelism. The horizontal edges are separated by about three feet. The horizontal edges define a horizontal reference plane over which a sheet section of paper web is mildly tensioned with the web machine direction of the paper sheet oriented transversely of the edges. Substantially between the horizontal edges but slightly below the horizonta...

A thread ring gauge holder that is used with a thread ring gauge to eliminate the variance in applied torque from different people using the thread ring gauge. This device allows the thread ring gauge to be protected from an excessive amount of torque and from a premature false reading from applying too little torque from a wide variety of users. The device can be used together with a variety of thread ring gauges and is made up of a ring gauge adapter, a ratchet drive, a ratchet gear, a protect...

A semiconductor process endpoint detection system uses a relatively wide wavelength range of light to reflect off a semiconductor wafer being processed. Relatively narrow wavelength ranges can be monitored within this wide reflected wavelength range in order to produce an endpoint of the process. An indication can be produced which is a function of detected light intensities at multiple wavelength ranges. These indications aid in the determination of an endpoint of a process.

A tool is provided for facilitating angular alignment of a hydrofoil coupled to a mounting block having a flat bottom surface area. The mounting block is pivotally coupled to a cylindrical strut having a longitudinal axis. The tool has a saddle for engaging the cylindrical strut and a plate coupled to the saddle. The plate has an alignment edge that, when positioned by the saddle beneath the flat bottom surface area of the mounting block, forms a desired angle with respect to the longitudinal ax...