A gas discharge lamp for the wavelength range of extreme ultraviolet radiation and/or soft X-ray radiation has at least two electrodes for providing a radiaton-emitting plasma in the intervening discharge space. One of the electrodes has a continuous opening to an adjoining outer region where charge carriers can be generated which can be transported through the opening in to the discharge space. The electrode opening narrows in the direction of the outer region.

A device and method for generating extremely short-wave ultraviolet electromagnetic wave, utilizing a theta pinch plasma generator to produce electromagnetic radiation in the range of 10 to 20 nm. The device comprises an axially aligned open-ended pinch chamber defining a plasma zone adapted to contain a plasma generating gas within the plasma zone; a means for generating a magnetic field radially outward of the open-ended pinch chamber to produce a discharge plasma from the plasma generating ga...

An EUV light source collector erosion mitigation system and method is disclosed which may comprise a collector comprising a multilayered mirror collector comprising a collector outer surface composed of a capping material subject to removal due to a removing interaction with materials created in an EUV light-creating plasma; a replacement material generator positioned to deliver replacement material comprising the capping material to the collector outer surface at a rate sufficient to replace th...

A device and method for generating extremely short-wave ultraviolet electromagnetic wave uses two intersecting plasma beams generated by two plasma accelerators. The intersection of the two plasma beams emits electromagnetic radiation and in particular radiation in the extreme ultraviolet wavelength. In the preferred orientation two axially aligned counter streaming plasmas collide to produce an intense source of electromagnetic radiation at the 13.5 nm wavelength. The Mather type plasma acceler...

A method for generating extreme ultraviolet radiation and soft x-ray radiation with a gas discharge operated on the left branch of the Paschen curve, in particular, for EUV lithography,wherein a discharge chamber (10) of a predetermined gas pressure and two electrodes (11, 12) are used, wherein the electrodes have an opening (14, 15), respectively, positioned on the same symmetry axis (13) and, in the course of a voltage increase (16) upon reaching a predetermined ignition voltage (U.sub.z), gen...

According to one aspect of the invention, a method and apparatus for producing electromagnetic radiation is provided. The apparatus may include a chamber wall enclosing a plasma emission chamber to contain a plasma emission gas. A first electrode may be within the plasma emission chamber. At least one second electrode may within the plasma emission chamber. The at least one second electrode may be rotatable about an axis thereof and positioned within the plasma emission chamber such that when a ...

An LPP EUV light source device for forming a uniform droplet target regardless of a frequency of a drive signal applied to a vibrator. The LPP EUV light source device includes: a chamber in which the extreme ultra violet light is generated; an injection nozzle that injects a target material into the chamber; a vibrator that has two terminals and vibrates to provide vibration to the injection nozzle when a drive signal is applied between the two terminals via a cable; a voltage generator that gen...

A UV system, such as used in UV curing of dielectric material, for example, and a method of making the same, has a reflector and a localized UV source positioned at an optical center of the reflector. The window separates the UV source from a work piece. The UV source is on a first side of the window and the work piece is on a second side of the window. A partially reflecting mirror is provided on the first side of the window. The partially reflecting mirror, with the reflector and localized UV ...

A dense plasma focus radiation source for generating EUV radiation using Lithium vapor and including a coaxially disposed anode and cathode. The invention includes methods and apparatuses for enhancing the efficiency of EUV radiation production, for protecting, cooling and extending the life of the anode and cathode, for protecting and shielding collecting optics from debris and pressure disturbances in the discharge chamber, and for feeding Lithium into the discharge chamber.

A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion materi...