A thermal CVD process for forming silicon carbide-type films onto a substrate comprising the steps of: (a) introducing di-tert-butylsilane vapor into a CVD reaction zone containing said substrate on which a silicon carbide film is to be formed; (b) maintaining the temperature of said zone and said substrate at about 400.degree. C. to about 1,100.degree. C.; (c) maintaining the pressure in said zone at about 0.1 to about 10 torr; and (d) passing said vapor into contact with said substrate for a p...








