A storage device containing a quantity of a liquid chemical substance which is used as a reactant in a chemical process, the device being composed of: a closed container holding the quantity of substance and having a wall provided with an inlet opening and an outlet opening; an inlet valve coupled to said inlet opening, the inlet valve being closeable to block said inlet opening; an outlet valve coupled to the outlet opening, the outlet valve being closeable to block the outlet opening; and a fi...

A wafer position error detection and correction system determines the presence of a wafer on a wafer transport robot blade. The system also determines a wafer position error by monitoring the position of the wafer with respect to the blade with one sensor which is located proximate to each entrance of a process chamber. When a wafer position error is detected, the system determines the extent of the misalignment and corrects such misalignment if correctable by the wafer transport robot or alerts...

In a method and apparatus for producing a vapor containing a liquid chemical by bubbling a carrier gas through a mass of the liquid chemical, vapor production is monitored by: determining successive values of the pressure of the carrier gas being delivered to the mass of liquid chemical, over a time period; and calculating, on the basis of the successive values of the pressure, the frequency of bubble formation during the bubbling of the carrier gas.

Embodiments include a disk drive having a drive motor assembly including at least one component selected from the group consisting of a rotatable hub, disk spacer, disk clamp, backiron, lower bearing bushing, and lower mounting flange. At least one of the components comprises a low sulfur outgassing free machining stainless steel material. The low sulfur outgassing free machining stainless steel material may include a free machining stainless steel that outgases sulfur at a rate insufficient to ...

A semiconductor processing system having a holding chamber coupled to a mainframe processing system and at least one loadlock chamber coupled to the holding chamber in which unprocessed wafers are transferred from the loadlock chamber to the holding chamber for subsequent processing by the mainframe system.

A method and apparatus for pre-heating a coil used to generate a plasma field in a processing chamber in a semiconductor fabrication system. The coil is pre-heated in the chamber prior to sputter depositing material onto a substrate and workpiece. The coil is pre-heated to a predetermined temperature, which is preferably equal to or greater than the equilibrium temperature attained by the coil during sputter deposition processes. Pre-heating may be effected with a preheating current having a fre...

An insulative inter-turn shield positioned at the channel in coil windings to confine the plasma generated by energy radiated by the coil windings in an apparatus for sputtering material onto a workpiece. The insulative shield can prevent the escape of the plasma through the channel between the windings to thereby improve the effectiveness of the sputtering process. In addition, the shield can also block the passage of sputtered material through the channel, preventing the contamination of the v...

In a plasma generating apparatus, a coil is positioned between a target and a workpiece to inductively couple RF energy into a plasma so that the paths of a portion of the ionized deposition material are deflected from the center of the workpiece and toward the edges of the workpiece. As a consequence, it has been found that the uniformity of deposition may be improved. In the illustrated embodiment, the coil is a multi-turn coil formed in a generally planar spiral centered in the stream of depo...

A magnetic card is set to an exclusive cardholder and inserted into a passbook printer. The passbook printer can read a magnetic stripe of a passbook and print the passbook or a document. The cardholder is fed by a feed roller or the like. Control device can detect the length of the cardholder by an insertion slot sensor. The control device adjusts the position of a magnetic stripe to the position of a magnetic head by the feed roller and the magnetic stripe is read by the magnetic head. The con...

Variable reactances in an impedance-matching box for an RF coil, in a plasma deposition system for depositing a film of sputtered target material on a substrate, can be varied by rotating inductor cores during the deposition process so that the RF coil and substrate heating, and the film deposition, are more uniform due to "time-averaging" of the RF voltage distributions along the RF coil.