A photosensitive composition of the present invention has excellent sensitivity and pattern profile, which comprises an acid generator having a specific structure.

A printed document or other device comprising a polymer substrate having a surface to which printed matter is applied, a reflective or brightly colored layer applied directly to said surface by means of a printing process, and a printed image applied to the reflective or brightly colored layer by an intaglio printing process.

Novel ester compounds having a sulfonamide structure are polymerizable into polymers having improved transparency at wavelength of up to 300 nm, especially ArF excimer laser light, and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

A method for producing a precursor polymer dispersion for addition to a brine for use in drilling and completion operations comprising providing a precursor brine having a first salt content, and mixing a water-soluble polymer with the precursor brine at a sufficient concentration and under conditions sufficient to produce a precursor polymer dispersion effective at a sufficient concentration in a final brine having a second salt content to improve the rheology and/or fluid loss control properti...

Fiber for reinforcing rubber products, which comprises glass fiber coated with a coating film formed by a treating agent comprising a water-soluble condensate of resorcinol and formaldehyde, a latex of a solid acrylonitrile/butadiene copolymer and a latex of a liquid acrylonitrile/butadiene copolymer.

The present invention relates to the use of at least one radiation crosslinkable, preferably UV crosslinkable, polymer composition as a data recording medium, especially in the form of what are known as smart coatings based on such polymer compositions, which in a further embodiment comprises at least one fluorescence chromophore, and also to a composite at least comprising one support and one layer comprising a radiation crosslinkable polymer composition comprising at least one fluorescence chr...

A pretreatment composition of: (a) at least one compound having structure VI V.sup.1--Y--V.sup.2VI wherein Y is selected from the group consisting of S, O, NR.sup.2, (HOCH).sub.p, and ##STR00001## each R.sup.1 is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R.sup.2 is independently H, SH, CH.sub.3, C.sub.2H.sub.5, and a linear or branched C.sub.1-C.sub.4 alkyl group containing a thiol group; and wherein V.sup.1 and V.sup.2 ...

A polymer for forming an organic anti-reflective coating layer between an etching layer and a photoresist layer to absorb an exposure light in a photolithography process and a composition comprising the same are disclosed. The polymer for forming an organic anti-reflective coating layer has a repeating unit represented by ##STR00001## wherein, R.sub.1 is hydrogen or methyl group, and R.sub.2 is a substituted or non-substituted alky group of C1 to C5. The composition for forming the organic anti-...

Disclosed herein is multilayered sheet comprising a core layer comprising a thermoplastic polymer and an IR absorbing additive; wherein the IR absorbing additive is a metal oxide; and a first cap layer comprising a thermoplastic polymer and an electromagnetic radiation absorbing additive; wherein a surface of the first cap layer is disposed upon and in intimate contact with a surface of the core layer. Disclosed herein too is a method for manufacturing a multilayered sheet comprising melt blendi...

Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include: (a) a polymer component including at least one polymer having a monomeric unit of Formula (I) ##STR00001## wherein R.sub.1 and R.sub.2 may each independently be hydrogen, hydroxyl, alkyl, aryl, allyl, halo, or any combination thereof; R.sub.3 and R.sub....