A packaging structure for an optical sensor with drill holes formed directly below an underfill layer includes a substrate having a plurality of drill holes, a plurality of vias, a plurality of traces, a plurality of gold wires, an underfill layer, a die having a plurality of bonding pads, and a container for isolating the die from the ambient atmosphere. The plurality of vias are formed within the plurality of drill holes and the plurality of bonding fingers are formed on the substrate. The plu...

A disclosed substrate includes a base member having a through-hole, and a conductive metal filling in the through-hole so as to form a penetrating via. The penetrating via contains a conductive core member that is substantially at the central axis of the through-hole.

A semiconductor component includes a semiconductor substrate having a substrate contact, and a through wire interconnect (TWI) bonded to the substrate contact. The through wire interconnect (TWI) includes a via through the substrate contact and the substrate, a wire in the via bonded to the substrate contact, and a contact on the wire. A stacked semiconductor component includes the semiconductor substrate, and a second semiconductor substrate stacked on the substrate and bonded to a through wire...

An insulating film having dielectric constant not greater than 2.7 is provided above a semiconductor substrate. A via comprises a conductive material, which is provided in a via hole formed in the insulating film. A first interconnection comprises a conductive material, which is provided in an interconnection trench formed on the via in the insulating film. A first high-density region is formed in the insulating film, and has a cylindrical shape surrounding the via, an inner surface common to th...

An interconnection forming step provides an interconnection with an improved yield, a low cost and a high reliability. A semiconductor device includes an insulating layer formed on a silicon substrate and having a groove extending in a predetermined direction. A distance between side walls defining insulating layer increases as a position moves away from silicon substrate. The semiconductor device includes a conductive layer filling groove.

In a semiconductor device constituted using a borderless contact technique, for example, when a wiring layer with a damascene structure is connected to its underlying contact portion, a trench connecting with the contact portion is formed in the second interlayer insulation film. After that, the contact portion protruded from the bottom of the trench is selectively etched to flatten the bottom of the trench to remove a very small recess from that bottom of the trench which corresponds to a conta...

A fabrication method for a semiconductor device is provided, which is able to increase pattern-to-pattern lithography overlay accuracy. After a first layer made of a first material is formed, first and second slits serving as a first alignment mark are formed in the first layer. The first and second slits are spaced with a specific distance and are approximately parallel to each other. Each of the first and second slits is filled with a second material. Then, a second layer made of a third mater...

Conductive sidewall spacer structures are formed using a method that patterns structures (mandrels) and activates the sidewalls of the structures. Metal ions are attached to the sidewalls of the structures and these metal ions are reduced to form seed material. The structures are then trimmed and the seed material is plated to form wiring on the sidewalls of the structures.

The system includes a circuit board, a semiconductor module, a heat dissipator, and at least one thermal via. The circuit board has substantially flat opposing first and second sides. The semiconductor module includes multiple semiconductor devices. The semiconductor module is oriented substantially parallel to the circuit board near the first side, while the heat dissipator is disposed near the second side. The thermal via extends through the circuit board to thermally couple the semiconductor ...

After an interlayer insulation film (1) and a CMP stopper film are formed, wiring trenches are formed. Next, after a barrier metal film (4) and a Cu film (5) are buried in the wiring trenches, the Cu film (5) and the barrier metal film (4) are planarized by CMP or the like until the CMP stopper film is exposed, whereby lower wirings (17) are formed. Next, the CMP stopper film is removed by dry etching, so that surfaces of the lower wirings (17) relatively protrude from their surrounding area. Su...