A plasma processing apparatus comprises a reaction chamber, an upper electrode, a lower electrode which confronts the upper electrode and also functions as a sample stage, means of supplying RF power between the upper electrode and lower electrode such that the RF power is supplied to one of the upper and lower electrodes, with another electrode and the reaction chamber being grounded, and RF impedance matching means, wherein the capacitance between the grounded electrode and the reaction chambe...

The plasma processing apparatus and plasma processing method of the present invention are suitable for the application of plasma processing to etching, ashing, CVD, etc. in the manufacturing of large scale integrated circuits (LSIs) and liquid crystal display panels (LCDs), and useful for the manufacturing of LSIs and LCDs. The apparatus is characterized in that the reaction chamber has its side wall separated into an inner side wall which faces to the interior of the reaction chamber and an out...

A low-cost plasma processing apparatus which permits reduction of the cost, as well as reduction of the loss of transmitted power. The plasma processing apparatus 1 has an apparatus main body 2 and auxiliary equipment 3. The auxiliary equipment 3 is comprised of a power supply apparatus 5 that supplies power to a processing chamber 4, and a plurality of dry pumps 6 and 7, and so on. The power supply apparatus 5 is comprised of a matching unit 9, an RF amplifier 13 that is connected to the matchi...

An electrical joint forming member is held between adjacent conductive members included in a semiconductor device fabricating apparatus to reduce electrical resistance between those conductive members. The electrical joint forming member includes an elastic member made of a titanium sheet (75 .mu.m thick, 2 mm wide) and having a surface covered with an aluminum layer (7 .mu.m thick), the aluminum layer being formed by joining an aluminum sheet to the surface of the titanium sheet by cold-roll bo...

An apparatus for limiting deviation of an endless belt/belt sleeve from a desired rotational path. The apparatus has first and second rollers each having a rotational axis and cooperatively supporting an endless belt/belt sleeve trained therearound for rotational movement in a predetermined path. A first member is mounted on one of the first and second rollers for movement axially relative to the one of the first and second rollers. A blocking structure defines a shoulder for engagement with an ...

A method for detecting an etching endpoint and a plasma etching apparatus and a plasma etching system using such a device are disclosed, in which time series data of a signal corresponding to the amount of light of the plasma light generated during the plasma etching process are arithmetically processed, so that the change of light amount is corrected and an etching endpoint is detected from the time series data after the correction.

A method for detecting an etching endpoint and a plasma etching apparatus and a plasma etching system using such a device are disclosed, in which time series data of a signal corresponding to the amount of light of the plasma light generated during the plasma etching process are arithmetically processed, so that the change of light amount is corrected and an etching endpoint is detected from the time series data after the correction.

A vector expressing two foreign genes by using RRE sequence and controlling the ratio of the expression doses of these genes owing to the modification is provided. This vector, which can be provided as a lentivirus vector based on SIVagm, is constructed by modifying a virus-origin expression regulatory sequence into another expression regulatory sequence so as to eliminate the dependency on the virus-origin protein. Although this vector has a packaging signal, it has been modified so that the ri...

A method for detecting an etching endpoint and a plasma etching apparatus and a plasma etching system using such a device are disclosed, in which time series data of a signal corresponding to the amount of light of the plasma light generated during the plasma etching process are arithmetically processed, so that the change of light amount is corrected and an etching endpoint is detected from the time series data after the correction.

A grinding wheel for treating a surface of a power transmission belt/belt sleeve. The grinding wheel has a cylindrical body defining a rotational axis and having a circumferential outer surface with there being a plurality of abrading elements arranged in circumferentially spaced relationship on the outer surface of the body. Reliefs are provided between adjacent abrading elements. The invention further contemplates a method of treating a belt using the inventive grinding wheel.