A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus comprises a turntable having a polishing surface, and a top ring having a pressing surface for holding a workpiece to be polished and pressing the workpiece against the polishing surface of the turntable. At least one of the polishing surface of the turntable and the pressing surface of the top ring is a curved surface such as a convex surface or a concave.

A polishing apparatus comprises a carrier having a pressing surface to be engaged with a platy workpiece to press it against a polishing surface, whereby the workpiece is polished by being subjected to a relative sliding motion relative to the polishing surface while being pressed thereagainst. The pressing surface includes a suction opening provided along an outer peripheral portion of the pressing surface for applying a vacuum to hold the workpiece on the pressing surface during polishing of t...

A workpiece carrier has a top ring body for holding a workpiece, a drive shaft for rotating the top ring body and moving the top ring body toward a turntable to press the workpiece against a polishing surface, and a universal joint for transmitting a pressing force from the drive shaft to the top ring body while allowing the drive shaft and the top ring body to be tilted relatively to each other. The universal joint includes two members having curved surfaces formed along arcs having a predeterm...

The present invention relates to a plant diseases controlling composition containing as active ingredients: the pyrazolinone derivative represented by Chemical Formula: ##STR1## wherein R.sub.1 represents halogen or methyl optionally substituted with halogen, R.sub.2 represents hydrogen, halogen or methyl optionally substituted with halogen, R.sub.3 represents isopropyl, sec-butyl, 1-ethylpropyl, 1-methylbutyl, tert-butyl or 1,1-dimethylpropyl, R.sub.4 representing oxygen or sulfur, R.sub.5 repr...

A polishing apparatus is used for polishing a workpiece such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes a turntable having a polishing surface, and a top ring having a pressing surface for holding a workpiece to be polished and pressing the workpiece against the polishing surface of the turntable. At least one of the polishing surface of the turntable and the pressing surface of the top ring is a curved surface such as a convex surface or a concave surface...

A workpiece carrier has a top ring body for holding a workpiece, a drive shaft for rotating the top ring body and moving the top ring body toward a turntable to press the workpiece against a polishing surface, and a universal joint for transmitting a pressing force from the drive shaft to the top ring body while allowing the drive shaft and the top ring body to be tilted relative to each other. The universal joint includes two members having curved surfaces formed along arcs having a predetermin...

A polishing apparatus for polishing a plate-like workpiece by way of a relative sliding motion between the plate-like workpiece and a polishing surface. The polishing apparatus comprises a carrier for holding the plate-like workpiece. The carrier comprises a carrier body having a flat surface and one or more recesses formed in the carrier body surface, an inner sheet covering the carrier body surface and having an outer peripheral edge sealingly connected to the carrier body, an outer sheet cove...

A copper layer is formed in wiring grooves formed in a semiconductor substrate and also on the semiconductor substrate. The semiconductor substrate is brought into contact with a culture solution containing bacteria whose size is larger than the width of the wiring grooves. The copper layer on the semiconductor substrate is removed by the bacteria comprising autotroph, but the copper layer in the wiring grooves is not removed because the bacteria cannot enter the wiring grooves.

An information signal recording apparatus for recording information signals on a recording medium comprises information signals which are input to the apparatus in a predetermined quantity. The apparatus is adapted to retain the information signals thus input and allows an arbitrary portion of the predetermined quantity of information signals to be designated. The designated portion of the predetermined quantity of information signals can be edited before the information signals are recorded on ...

A microbiological prevention of aflatoxin contamination in cereals and nuts is provided. Bacillus subtilis NK-330 and NK-C-3 effectively inhibit not only growth of aflatoxin-producing fungi including Aspergillus flavus and Aspergillus parasiticus but also production of aflatoxin by them.