
An alignment method in which light is diffracted from a mask grating to a wafer grating and back through the mask grating to produce a set of output diffraction orders. The intensity of the zeroth output order is monitored and the mask is translated and rotated within the plane containing the mask to align the mask with the wafer. Alignment occurs when the intensity of the zeroth output order is at an extremum. The distance between the mask and wafer is also adjusted to extremize the intensity o...











