A cleaning liquid is provided, which comprises an aqueous solution containing nitric acid, sulfuric acid, a fluorine compound, and a basic compound. The concentration of water in the cleaning liquid is 80% by weight or more, and the pH value of the cleaning liquid is from 1 to less than 3. The cleaning liquid is effective for removing etching residues formed in a dry etching process from semiconductor devices and display devices without oxidizing and corroding their metal wirings, particularly, ...

A cleaning implement for hard surface cleaning is provided. This cleaning implement includes a handle, a mop head pivotably attached to said handle, and which has a pad forming a bottom surface, and at least one elevational element removably attached to the bottom surface of the pad. The elevational element provides the mop with the ability to pivot relative the surface to be cleaned. This cleaning implement is used in synergy with a disposable absorbent cleaning pad engaging the elevational ele...

A cleaning machine for cleaning a surface is provided. The cleaning machine includes a base assembly that moves along the surface and a liquid distribution system associated with the base assembly for distributing the cleaning solution to the cleaning surface. A suction nozzle assembly is mounted to the base assembly and includes a front nozzle portion and a rear nozzle portion. The front nozzle portion defines a fluid flow path having an inlet opening and an outlet opening and the rear nozzle p...

A cleaning apparatus and a cleaning method wherein cleaning and drying can be carried out in the same cleaning apparatus without the risk of reverse contamination of the cleaned object after the drying process. The cleaning apparatus includes a supporting device for supporting an object to be cleaned, and a cleaning cup surrounding the supporting device to prevent splashing of a cleaning liquid. The cleaning apparatus includes a cleaning device for cleaning an inner wall of the cleaning cup with...

A cleaning apparatus for cleaning a surface in which cleaning solution is distributed to the surface and substantially simultaneously extracted along with the dirt on the surface in a continuous operation as it moves along the surface is provided. The cleaning apparatus includes a housing and a liquid distribution system operatively associated with the housing. The liquid distribution system includes a fluid source providing a supply of the cleaning solution and a distributor fluidly connected t...

A cleaning effect is improved by cleaning a component that has a recess structure by using a cleaning medium of a liquefied gas or a supercritical fluid. By the cleaning method of removing adhering substances adhering to at least the surface of the recess structure of the component that has the recess structure, cleaning is carried out by using the supercritical gas or the liquefied gas so that the cleaning medium spreads over the surface of the recess structure.

In a cleaning apparatus, a cleaning solution spray means itself is given a function of producing OH.sup.- ionized water and H.sup.+ ionized water and can spray OH.sup.- ionized water and H.sup.+ ionized water, as cleaning solutions immediately after they are produced, upon a substrate to be cleaned, and one of OH.sup.- ionized water and H.sup.+ ionized water can be selectively used as a cleaning solution. This cleaning apparatus includes a substrate holding member for holding a substrate to be c...

In a cleaning nozzle, a trumpet-shaped portion made up of multiple inclined portions or a curved portion is formed upstream of a minimum diameter portion of an ejection nozzle portion of a converging-diverging shape, and a gas ejection port is opened to an intermediate part of the trumpet-shaped portion. Inside the gas ejection port is formed a cleaning liquid ejection port. A gas is ejected at a higher speed than that of a cleaning liquid from the cleaning liquid ejection port to transform the ...

The cleaning agent described above comprises a surfactant and an organic solvent, and the cleaning method described above is characterized by allowing the cleaning agent described above to flow on the surface of the material to be treated at a high speed to thereby clean the above surface. According to the present invention, deposits adhering firmly to a surface of a material to be treated can readily be removed without damaging the material to be treated.

A cleaning system and a cleaning method is provided with a cleaning medium comprising a magnetic substance and a magnetic field generating device for applying a magnetic force to the magnetic substance in the cleaning medium so that the magnetic substance and the area to be cleaned are rubbed together. The area to be cleaned is cleaned by the rubbing action of the cleaning medium. The interior of the cleaned object not reachable by hands or instruments can be easily cleaned with this device. The...