Hard and wear resistant deposited steel including martensite base and vanadium-carbide dispersed therein with the amount of vanadium of 32 to 40 percent in weight. A method for producing the hard and wear resistant steel, said method comprising steps of compression forming powder materials into a welding rod, melting the rod in a non-oxidizing atmosphere by means of a heat produced by an electric arc discharge, and heat treating the solidified substance thus obtained. The invention further provi...

A magnetic recording head including a composite element formed by a inner layer of conductive material sandwiched between two layers of readily magnetisable material. A conductive outer layer is disposed over at least a portion of each magnetisable layer, these outer layers being electrically interconnected solely by the inner conductive layer.

A method comprising providing a substrate with an electrode-forming layer on the surface thereof, placing the substrate in a contaminant-free space and while in said space removing the exposed surface portions of said electrode-forming layer and depositing generally over the substrate and said electrode-forming layer an active semiconductor material forming a semiconductor switch device, applying a mask over selected areas of said active semiconductor material to cover only the area thereof to b...

An epitaxially deposited source/drain extension may be formed for a metal oxide semiconductor field effect transistor. A sacrificial layer may be formed and etched away to undercut under the gate electrode. Then a source/drain extension of epitaxial silicon may be deposited to extend under the edges of the gate electrode. As a result, the extent by which the source/drain extension extends under the gate may be controlled by controlling the etching of the sacrificial material. Its thickness and d...

An optical element, such as a waveguide, is formed by utilizing a plasma deposited precursor optical material wherein the plasma deposition is a two-component reaction comprising a silicon donor, which is non-carbon containing and non-oxygenated, and an organic precursor, which is non-silicon containing and non-oxygenated. The plasma deposition produces a precursor optical material that can be selectively photo-oxidized by exposure to electromagnetic energy in the presence of oxygen to produce p...

Methods for improving microstructures of line-of-sight deposited films are described. Columnar growth defects ordinarily produced by geometrical shadowing during deposition of such films are eliminated without resorting to post-deposition thermal or mechanical treatments. The native, as-deposited coating qualities, including homogeneity, fine grain size, and high coating-to-substrate adherence, can thus be retained. The preferred method includes the steps of emitting material from a source towar...

A method for providing an electroless plate, particularly a discontinuous plate for uses such as for electrolytic cell cathodes. A nickel substrate is interdiffused with a second metal which, when leached out leaves a hydrogen adsorbing surface upon the substrate. The substrate is then contacted with a dilute, at least 20 ppm, solution of the plating metal, preferably with the plating metal in anionic complex in the solution. Following immersion, the resulting plated substrate is passed through ...

A radiation curable monomer and a dystuff are mixed in a curable formulation and fed into a hot evaporator under vacuum. The blend is flash evaporated through a nozzle and recondensed onto a moving substrate in contact with a temperature-controlled rotating drum. The condensed film is then crosslinked with a high-energy ultraviolet or electron-beam radiation source to effect cross-linking of the monomer. The resulting product consists of a crosslinked polymer matrix incorporating dyestuff molecu...

A device for forming a deposited film is provided. It comprises (a) a reaction chamber; (b) a heating means for heating a substrate placed in the reaction chamber; (c) a starting gas introducing means for introducing starting gases into the reaction chamber, the gas introducing means having a means for introducing two or more kinds of gases alternately and intermittently into the reaction chamber; (d) a decomposing means for decomposing the starting gases in the reaction chamber so as to form a ...

A process for forming a deposited film on a substrate according to the chemical vapor deposition method comprises previously forming excited species of a gas phase compound containing atoms which become constituents constituting said deposited film, supplying the excited species onto the surface of said substrate and effecting photoirradiation on said substrate surface, thereby forming the deposited film through the surface reaction.