A lithographic method and apparatus for creating ultra-fine (sub-25 nm) patterns in a thin film coated on a substrate is provided, in which a mold having at least one protruding feature is pressed into a thin film carried on a substrate. The protruding feature in the mold creates a recess of the thin film. The mold is removed from the film. The thin film then is processed such that the thin film in the recess is removed exposing the underlying substrate. Thus, the patterns in the mold is replace...

The invention relates to a method for microstructuring electronic components, which yields high resolutions (.ltoreq.200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods. The inventive method comprises the following steps: i) a planar unhardened sol film of a nanocomposite composition according to claim 1 is produced; ii) a target substrate consisting of a bottom coat (b) and a support (c) is produced; iii) sol film material obtained in step i) i...

A microimprint/nanoimprint device includes a mold, a substrate and an energy transferring module. The substrate is disposed oppositely to the mold and at least has a molding material layer. The energy transferring module includes an energy transferring member and at least one energy source, wherein the energy transferring member is connected to the substrate or the mold, and the energy source provides imprint energy to the substrate or the mold, such that at least part of the imprint energy goes...

Provided is a method of fabricating a nanoimprint mold which can form sub-100 nm fine pattern structures. The method includes forming patterns on a first substrate using an E-beam lithography (EBL) process, and transferring the patterns formed on the first substrate to a second substrate using a nanoimprint lithography (NIL) process to complete an NIL mold. Accordingly, the method can easily fabricate the nanoimprint mold at low costs on a quartz or glass substrate, which is not suitable for an ...

A nanoimprint lithography method of fabricating a nanoadhesive includes steps of (a) preparing a substrate and a transfer stamp, said transfer stamp having a transfer face and nanometer-scale features formed on said transfer face, said nanometer-scale features having a plurality of convexities and concavities, said substrate having an etched layer; (b) proceeding a staining process to enable either of said convexities and concavities to be stained with a photoresist; (c) proceeding a transfer pr...

A microimprint/nanoimprint uniform pressing apparatus is used to provide uniform imprinting pressure to a molding material layer between a substrate and a mold. The uniform pressing apparatus includes a uniform pressing unit for being directly in contact with the mold or the substrate, so as to allow each point to have equal pressure during imprinting and utilize a simple structure to transmit uniform imprinting pressure.

The present invention provides a method for in-situ real-time monitoring of mold deformation by using a database to store temporary information during the following steps: (a) providing a mark on the mold body that is easy to observe in order to monitor the mold deformation, (b) installing a signal source and a monitor device for monitoring the deformation quantity on the mold, (c) transforming the above deformation quantity into computer signals for storing in the database and (d) issuing contr...

The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula: or RELEASE is a molecular chain of from 4 to 20 atoms in length, preferably from 6 to 16 atoms in length, which molecule has either polar or non-polar properties; M is a metal atom, semiconductor atom, or semimetal atom; X is halogen or cyano, especially Cl, F, or Br; Q is hydrogen or alkyl group; m is the number of Q groups; R is hydroge...

A UV nanoimprint lithography process for forming nanostructures on a substrate. The process includes depositing a resist on a substrate; contacting a stamp having formed thereon nanostructures at areas corresponding to where nanostructures on the substrate are to be formed to an upper surface of the resist, and applying a predetermined pressure to the stamp in a direction toward the substrate, the contacting and applying being performed at room temperature and at low pressure; irradiating ultrav...