
A patterning device comprises a patterning cavity which has an opening located at the surface of the patterning device within a transfer region, where a substrate during patterning comes into conformal contact with the patterning device. A service cavity is located in a service region of the patterning device and is connected to the patterning cavity, such that a patterning fluid is able to flow from the service cavity to the patterning cavity. A patterning method uses this device.









