
There is provided an ophthalmic characteristic measuring apparatus in which when a wavefront measurement is carried out, an adjustment of an exposure amount, such as an exposure time or a light amount of a light source, is carried out. A first light source section emits light flux with a first wavelength. A first illumination optical system illuminates a minute area on a retina of a subject eye with the first flux from the first light source. A first light receiving optical system guides a part ...











