A solid composition comprising a. about 5 to 85 wt % of an acylisethionate salt, b. about 90 to 5 wt % of soap, and c. an effective amount of a metal chelating agent consisting solely of an agent selected from the group consisting of ethylene diamine tetra acetic acid, water soluble salts of said acid, and mixtures thereof, said composition having a pH of from about 7.2 to 10.

2,2,4,4,6,6-hexamitroadamantane and a method of making the same.

Provided are compositions comprising a saponified product of an ethylene-vinyl acetate copolymer having an ethylene content of 20 to 80 mol % and a saponification degree of vinyl acetate component of at least 95 mol %, said composition containing 20 to 200 ppm as converted to alkali metal of an alkali metal acetate, 30 to 250 ppm of acetic acid, and 5 to 500 ppm as converted to phosphate ion of phosphoric acid or an alkali metal hydrogenphosphate, and having a content ratio of acetic acid/alkali...

A mixture containing 3,3-bis(aziodomethyloxetane) and terephthalic acid for se as a white cloud producing composition which may be used by the military for screening field operations.

In accordance with the invention there is a composition comprising a ABS or ABS type resin in admixture with a mold release effective amount of a fluid hydrogenated oligomer of an alpha-olefin.

A composition which comprises a solvent extract of peat or a pyrolysis product of peat or a montan wax and petroleum bitumen of the paving grade type.

A polymeric composition having aromatic polycarbonate or aromatic polycarbonate like properties which process at significantly lower temperatures than aromatic polycarbonate in admixture with an additive which is incompatible with an aromatic polycarbonate at standard processing temperature.

A composition comprises a poly(oxyalkylene)glycol derivative and a long chain anhydride and optionally a hydroxy-oxime. The long chain anhydride can be an alk(en)yl succinic anhydride in which the alk(en)yl group contains at least six carbon atoms. The optional hydroxy-oxime can be an alkyl-substituted benzaldoxime. The composition has improved corrosion resistance and can provide protection of a metal even in the form of a thin film.

A polishing composition for reducing the haze level of the surface of silicon wafers contains hydroxyethyl cellulose, polyethylene oxide, an alkaline compound, water, and silicon dioxide.

A polishing composition and a rinsing composition according to the present invention can effectively suppress wafer contamination caused by metal impurities. The polishing composition includes a chelating agent, an alkali compound, silicon dioxide and water. The rinsing composition includes a chelating agent, an alkali compound and water. The chelating agent contained in the polishing composition and the rinsing composition is an acid represented by the following chemical formula (1) or a salt t...