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A method for concentrating particles, including: placing the particles close to and/or on at least one waveguide of a support, and injecting light radiation into the waveguide causing grouping of particles into one or plural clusters on the waveguides.
A process is provided for measuring a gas concentration with at least one thermal measuring element. The thermal measuring element is operated by pulses. A measured value of the gas concentration in the environment of the measuring element is obtained from the evaluation of the response of the measuring element to at least one single pulse by determining transient states of the thermal measuring element. From this the measured value of the gas concentration in the environment of the measuring el...
An optical rotation angle of linearly polarized light is modulated to obtain modulated light. The modulated light is passed through an inspection object containing an optically active substance. The optically active substance rotates an optical rotation angle of the modulated light. An intensity of light coming out of the inspection object is measured. Variation in the optical rotation angle of the modulated light is calculated based on the measured intensity and the angle to which the linearly ...
A system for maintaining a concentration range of an electroreducible metal species undergoing electrolysis within a predetermined concentration range comprises a first container containing a body of an electrolyte solution in which a metal is partially dissolved, a second container in fluid communication with the first container, the second container containing a second body of the solution, and a means for exchanging solution between the containers. The second container is configured with a me...
The invention provides a substrate bearing a low-emissivity coating. The low-emissivity coating comprises at least one graded film region. In certain embodiments, at least one graded film region is provided between the two infrared-reflective layers of a double-type low-emissivity coating. The graded film region has a substantially continuously decreasing concentration of a first dielectric material and a substantially continuously increasing concentration of a second dielectric material. Also p...
A gas concentration detector prevents deviation in output due to a difference in oxygen reactivity between electrode materials to accurately detect a specific gas component in a gas to be measured, such as NOx in an exhaust gas. A sensor element in an NOx sensor has a pump cell in a first chamber and a sensor cell for decomposing NOx and any remaining oxygen and a monitor cell for decomposing only remaining oxygen in a second chamber. An NOx concentration is detected based on a difference in cur...
Methods for concentrating hydrogen peroxide solutions have been described. The methods utilize a polymeric membrane separating a hydrogen peroxide solution from a sweep gas or permeate. The membrane is selective to the permeability of water over the permeability of hydrogen peroxide, thereby facilitating the concentration of the hydrogen peroxide solution through the transport of water through the membrane to the permeate. By utilizing methods in accordance with the invention, hydrogen peroxide ...
To provide a concentration measuring method which enables a stable and highly accurate concentration measurement while avoiding the step of making a background measurement.The concentration measuring apparatus includes: a concentration measuring contact that is brought into contact with a subject of measurement; a light source that emits light and enters the light into the concentration measuring contact; a polarizer that takes out p-polarized and s-polarized light components from the light whic...
An oxygen concentrating apparatus 10 for generating oxygen enriched gas by adsorbing and separating nitrogen gas from air, comprises; an oxygen concentrator 40 having an adsorption cylinder filled with adsorbent for adsorbing nitrogen gas, also having an air inlet port 44, an oxygen outlet port 50 and a nitrogen gas outlet port 46; a compressor 30 for supplying compressed air from the air inlet port 44; a sound insulation box 20, which surrounds the compressor 30, for reducing noise generated fr...
A high concentration silica slurry can be used for polishing of substrates, such as semiconductor materials. The slurry contains a silica powder dispersed in an solvent. The silica slurry has a silica concentration of more than 50% by weight and a viscosity of less than 1000 mPas, wherein the silica powder has a ratio DL/DT of less than 1.3, wherein DL is an average particle size of the silica powder measured by a laser diffraction particle size distribution method and DT is an average primary p...
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