A dielectric deposited on a substrate may be exposed to a salt solution. While exposed to the salt solution, an oxide is deposited on the dielectric.

The depositing apparatus described provides an arrangement wherein a hopper is positioned to direct a flow of material into a multiple number of individual streams. A rotating drum having a series of Y-shaped bores revolvable about an axis is positioned for individually communicating with a stream of said material in a first position, and successively depositing the material accumulated in each of said bores in another position. The arrangement includes means for controlling the movement of said...

The depositing apparatus described provides an arrangement wherein a hopper is positioned to direct a flow of material into a multiple number of individual streams. A rotating drum having a series of Y-shaped bores revolvable about an axis is positioned for individually communicating with a stream of said material in a first position, and successively depositing the material accumulated in each of said bores in another position. The arrangement includes means for controlling the movement of said...

A film depositing apparatus forms a film with a given thickness on each of a plurality of bases. The apparatus is provided with a casing removably mounted on a base section to form a film depositing chamber whose interior is isolated from the outside space; transfer mechanism for transferring the plurality of bases in one direction inside the film depositing chamber; gas supplying mechanism for feeding material gas into the casing, the gas supplying mechanism including injecting portions arrange...

The invention concerns an apparatus for depositing volatilizable non-thermosetting material on to a substrate. A cylindrical surface is rotated towards and away from the substrate and a feeder head spaced apart from the surface deposits the material thereover. Substantially the whole of the cylindrical surface is heated so that material deposited thereon and moved towards the substrate on rotation of the surface will be vaporized and deposited on the substrate.

A transfer plate having metering openings is slidably mounted between a pressurized meat source and a plurality of hollow transfer pins within which heaters are mounted. An air cylinder unit is coupled to momentarily jog the push bars, and a second fluid cylinder motor means is interconnected to the supporting bed to simultaneously jog the bed and then wipe the meat patties from the ends of the pins. Alternatively, an air chamber is mounted on top of the meat chamber connected by air tubes to bo...

An improved depositing machine wherein foodstuff is ejected from a manifold by nozzles which reciprocate within nipples on the manifold, the uniform distribution of the deposited material being insured by the use of arcuately shaped, equally and concentrically spaced openings in the nozzle. To interrupt the ejection of topping material at irregular intervals without stopping the machine, a perforated baffle and an adjacent perforated cover plate divide the manifold into an upper chamber and a lo...

The present invention is directed to a method whereby thin metal flakes are deposited on a solid substrate or base. The method consists essentially in providing flakes which are very thin and relatively small and suspending them in a volatile organic liquid. The substrate is then brought into contact with the suspension in order to form a film which contains a certain number of flakes. When the substrate is removed from the suspension and the liquid is allowed to evaporate, the flakes attach the...

An arrangement for depositing objects in a receptacle comprises a first conveyor which advances upwardly open cartons to a loading station and a second conveyor which conveys objects to be loaded seriatim to the loading station. A carriage is mounted for movement in one direction upwardly above and in at least substantial parallelism with the upper opening of the carton at the loading station, and another carriage is mounted on the first carriage for movement with reference thereto and to the op...

An improved method of depositing a semiconductor material from a gaseous reactant stream containing unwanted contaminants onto a substrate by contacting the gaseous reactant stream from which the semiconductor material is to be deposited with a solid form of the same semiconductor material before the gaseous reactant stream is passed over the substrate. The solid semiconductor material, for example, gallium arsenide, may take the form of a layer of gallium gallium coated on the wall of a reactor...