The present invention relates to apparatus for printing graphic forms simultaneously with information data. A graphic forms master is mounted on a relatively small forms drum which is coupled to rotate simultaneously with a photo-sensitive print drum. Light is reflected from the graphic forms master to a light sensitive transducer from where electrical signals, representing the graphics form, are transmitted to a signals merging circuit. Information data signals are also transmitted to the signa...

An overlay is applied to a substrate, for example in the manufacture of book covers, by serially wrapping the overlay around a first pair of oppositely disposed edges of the substrate, folding the corners of the overlay into the substrate and wrapping the overlay around the two remaining edges of the substrate. The first wrapping of the overlay around a pair of edges of the substrate is accomplished by feeding the substrate with the overlay adhered thereto through a wrapping station alternately ...

A video display control system with a relative position memory between a controller and a foreground memory to permit changing the correspondence between a control indicator, indicating a display line on a monitor, and that one of the blocks of foreground memory controlling the foreground characters to be displayed on that display monitor screen line. The controller indicator signal is provided directly to a background memory to indicate which block of data therein is to control the display for ...

To enable a moving image to be clearly displayed on a hold-type of a display, such as a liquid crystal display, by setting a shutter function in an overlay processor, a computer having a display for displaying a moving image includes a memory with an on-screen area for storing display image information and an off-screen area for storing image information of the moving image. The on-screen area includes a memory area used as a display area of the moving image and which stores predetermined key co...

An overlay mark for determining the relative position between two or more successive layers of a substrate or between two or more separately generated patterns on a single layer of a substrate is disclosed. The overlay mark includes a plurality of coarsely segmented lines that are formed by a plurality of finely segmented bars. In some cases, the coarsely segmented lines also include at least one dark field while being separated by a plurality of finely segmented bars and at least one clear fiel...

A method of designing an overlay mark, which is used to determine the relative position between two or more successive layers of a substrate or between two or more separately generated patterns on a single layer of a substrate, is disclosed. The method includes optimizing the geometry of a first element of the mark according to a first scale. The method further includes optimizing the geometry of a second element of the mark according to a second scale. The method additionally includes optimizin...

An overlay mark for determining the relative position between two or more successive layers of a substrate or between two or more separately generated patterns on a single layer of a substrate is disclosed. The overlay mark includes a plurality of working zones, which are used to calculate alignment between a first and a second layer of the substrate or between a first and a second pattern on a single layer of the substrate. Each of the working zones is positioned within the perimeter of the mar...

An overlay mark for determining the relative shift between two or more successive layers of a substrate via scanning is disclosed. The overlay mark includes at least one test pattern for determining the relative shift between a first and a second layer of the substrate in a first direction. The test pattern includes a first set of working zones and a second set of working zones. The first set of working zones are disposed on a first layer of the substrate and have at least two working zones diag...

An overlay mark for determining the relative shift between two or more successive layers of a substrate is disclosed. The overlay mark includes at least one test pattern for determining the relative shift between a first and a second layer of the substrate in a first direction. The test pattern includes a first set of working zones and a second set of working zones. The first set of working zones are disposed on a first layer of the substrate and have at least two working zones diagonally oppose...

This invention relates to overlay test measurement systems which are useful for testing lithographic instruments used in making microcircuits, which includes a single second-level pattern set in the middle of a checkerboard-like arrangement of first level patterns alternating with opaque patterns, the patterns being constructed and arranged so that if a second substantially identical cluster is imaged on the first cluster with the second level pattern of the second cluster aligned with any one o...