An apparatus is provided for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus includes a radiation source and a spatial modulator (SLM) having a multitude of modulating elements (pixels). It further includes an electronic data processing and delivery system feeding drive signals to the modulator, a precision mechanical system for moving said workpiece and an electronic control system coordinating the movement o...

The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask, a display panel or a microoptical device. The apparatus comprises a radiation source and a spatial modulator (SLM) having a multitude of modulating elements (pixels). It further comprises an electronic data processing and delivery system feeding drive signals to the modulator, a precision mechanical system for moving said workpiece and an electronic control system coor...

A pattern card has a base material being composed of a paper sheet and a color texture layer printed on the paper sheet. A wax layer is formed on the base material. A protection printing ink is coated on the wax layer. A picture printing ink is partially coated on the protection printing ink according to a designed picture's profile and contour. The protection printing ink and the picture can be mixed with wax in the proportion of 10%. Whereby, it is easy to remove the protection and picture pri...

There is provided a trimming pattern enabling trimming to be implemented with ease and time required for trimming to be shortened without causing damage to internal elements. The invention provides the trimming pattern for use in trimming of a semiconductor integrated circuit, comprising two pads to which a voltage is applied, a thin line part interconnecting the two pads, and two connecting parts disposed away from each side of the thin line part, and connected to an adjustment circuit and the ...

An expendable and machinable pattern material capable of being cast in large blocks without shrinkage and machined to a casting shape useful in the lost pattern process of investment casting, the material consisting essentially of ethylene-vinyl resin, fatty acid ketone, and fatty acid.

The present invention relates to a system and a method for recognizing a prescribed object, having a storage device for storing attribute information relating to the prescribed object, detecting means for detecting attributes in a detection range and for outputting corresponding detection information, first processing means for processing, in parallel and separately for each possible attribute type, the detection information for the detection means by using the attribute information from the sto...

A printed circuit board has an inverted-L-shaped antenna pattern, which is provided with a conductor pattern connected to a ground pattern, so formed thereon as to be in close proximity to the outside of an inverted-F-shaped antenna pattern which is provided with a conductor pattern connected to a feeding point and with a conductor pattern connected to a ground pattern. By making resonance frequency of each of the inverted-F-shaped antenna pattern and the inverted-L-shaped antenna pattern differ...

The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus may include a source for emitting light flashes, a spatial modulator having modulating elements (pixels), adapted to being illuminated by the radiation, and a projection system creating an image of the modulator on the workpiece. It may further include an electronic data processing and delivery system receiving a d...

A photomask pattern on a substrate is provided. The photomask pattern comprises a main pattern and a sub-resolution assistant feature. The sub-resolution assistant feature is located on the sides of the main pattern. Furthermore, the sub-resolution assistant feature comprises a first assistant feature and a second assistant feature. The first assistant feature is formed close to the main pattern and the second assistant feature is formed further away from the main pattern but adjacent to the fir...

In a pattern recognition system, a pattern which is to be recognized later is prescribed in a learning phase. This pattern is detected sequentially, that is to say the informative areas of the pattern are detected and, moreover, the spatial relationship between the areas is also stored. In the recognition phase, a hypothesis which indicates a presumed pattern and, furthermore, indicates where such further prominent areas should be located in the pattern to be recognized if the presumption is cor...