A processing apparatus essentially includes a rotatable rotor 21 for carrying semiconductor wafers W, a motor 22 for driving to rotate the rotor 21, a plurality of processing chambers for surrounding the wafers W carried by the rotor 21, for example, an inner chamber 23 and an outer chamber 24, a chemical supplying unit 50, an IPA supplying unit 60, a rinse supplying unit 70 and a drying fluid supplying unit 80. With this constitution of the apparatus, it is possible to prevent the wafers from b...

A develop processing apparatus is provided for processing an object with a developing solution, comprising a retaining member for rotatably retaining the object, a developing solution supply nozzle for supplying the developing solution to the object, a developing solution sucking nozzle for sucking the developing solution supplied to the object, a developing solution supply nozzle moving mechanism for moving the developing solution supply nozzle above the object, a developing solution sucking no...

A plating system is composed of a transfer device for performing transfer of a wafer, a plating unit and a washing/drying unit provided around the transfer device. Each unit is structured to be detachable from the plating system. The plating unit is divided into a wafer transfer section and a plating section by a separator, and atmosphere of each section is independently set.

A development processing apparatus includes a processing unit for storing a substrate S and a processing solution supply nozzle arranged above the substrate S stored in the processing unit. A processing solution storage is formed inside the supply nozzle. A supply passage for supplying the processing solution into the solution storage is connected to the supply nozzle. A plurality of eject holes for ejecting the processing solution in the solution storage are formed in a lower surface of the sup...

The present invention is to provide a processing system and a processing method which do not require the selection of processing recipes by operators and can provide high throughputs. The processing system for processing an object group of one object-to-be-processed, or two or more objects-to-be-processed in a processing vessel with a processing liquid, comprises a plurality of processing vessel groups M1, M2, M3 each of at least one or more processing vessels, which can perform the same process...

A processing apparatus essentially includes a rotatable rotor 21 for carrying semiconductor wafers W, a motor 22 for driving to rotate the rotor 21, a plurality of processing chambers for surrounding the wafers W carried by the rotor 21, for example, an inner chamber 23 and an outer chamber 24, a chemical supplying unit 50, an IPA supplying unit 60, a rinse supplying unit 70 and a drying fluid supplying unit 80. With this constitution of the apparatus, it is possible to prevent the wafers from b...

The disclosed system for extracting desired information from a speech signal includes means for taking overlapping samples of an utterance, computer means programmed to test each sample to determine whether it is voiced or unvoiced and for performing the following operations on each voiced sample: applying a 30 ms. Hamming window to smooth the edge of the signal and to ensure that false artifacts will not be present in the following processing stage, obtaining a magnitude spectrum using at least...

A rapid thermal processing apparatus and method wherein a transparent (e.g. quartz) vacuum wall is sealed to the process chamber by a radially elastically expandable metallic seal, e.g. a hollow metallic ring with a spring in its core, which has a soft surface portion which deforms inelastically to make a seal.

An optical processor includes a non-linear spatial light modulator defining an array of logic gates and having an output plane 10 ) and an input plane 12. The array is made up of a plurality of cells 14 each containing a plurality of logic gates 16. A lenslet array 18 comprising an array of lenslets 20 associated one with each cell 14 respectively focusses the oututs of the cells onto respective facets 22 of a holographic array 24. Each facet of the holographic array defines a predetermined mapp...

A processing apparatus and method which permits sputter deposition and which is compatible with a vacuum processing system wherein the wafers are largely transferred and processed in the face down position. This includes an additional wafer movement, wherein, after a wafer has been emplaced face down, in a position where it can be clamped against the susceptor, the susceptor is rotated from its approximately horizontal position up to a more nearly vertical position. While the wafer is in the mor...